Description
Taylor & Francis Ltd Basic Vacuum Technology 2Nd Edition 1998 Edition by A. Chambers
Vacuum technology is widely used in many manufacturing and developmental processes and its applications grow in scope and sophistication. It is an inter-disciplinary subject, embracing aspects of mechanical, electrical and chemical engineering, chemistry, and materials science while having a broad foundation in physics. In spite of its technological importance, and perhaps because of its cross-disciplinary nature, substantial teaching and training is not widely available. Basic Vacuum Technology aims to give readers a firm foundation of fundamental knowledge about the subject and the ability to apply it. This book is an introductory text on how to use vacuum techniques. It provides a good grounding in the basic scientific principles and concepts that underlie the production and measurement of vacua. The authors describe how these are applied in representative low, medium, high, and ultra-high vacuum systems and explain the most important practical aspects of the operation of a large variety of pumps, components, and measuring instrumentation. The book introduces numerical methods for analysis and prediction of the behavior of vacuum systems in terms of the properties of their individual elements and enables readers to recognize and resolve problems with malfunctioning systems. Preface to the First EditionPreface to the Second EditionAcknowledgmentsIntroductionGASESMoleculesBondingIonsMasses of atoms and moleculesBonding, energy and temperatureSolids, liquids and gasesThe kinetic description of a gasResults from kinetic theoryVapour pressure, evaporation and condensationGases and vapoursMacroscopic gas lawsGas mixtures and partial pressuresContinuum and molecular states of gas, Knudsen, number Kn = lambda/^IDHeat conduction in gasViscosity of gasesGas-surface scattering and molecular dragThermal transpirationSummaryReferencesGASES IN VACUUM SYSTEMSThe basic task, units and ranges of vacuaFormulas for important quantitiesQualitative description of the pumping processSurface processes and outgassingGas flow - formalitiesGas flow - mechanismsMolecular flow conductance of an apertureMaximum speed of a pump in the molecular flow regionMolecular flow through pipes - transmission probability and conductanceQuantitative description of the pumping processSummaryReferencesPUMPSPositive displacement pumpsKinetic pumpsEntrapment (capture) pumpsPump selectionMEASUREMENT OF PRESSURETotal pressure gaugesHydrostatic pressure gaugesThermal conductivity gaugesIonisation gaugesSpecial gauges for the low UHV and XHV regionsSpining rotor gauge (SRG)Calibration of vacuum gaugesPartial pressure gaugesThe magnetic sector analyzerThe quadropole residual gas analyzerDisplay of spectraInterpretation of spectraSummaryReferencesVACUUM MATERIALS AND COMPONENTSProperties requiredCommonly used materialsSealsCeramics and glassesPump fluidsFlangesFittingsMachining and construction of componentsSummaryAcknowledgementsReferencesCLEANINGGeneral considerationsProcedure selectionCleaning proceduresPackagingGeneral cleaning techniques Special cleaning processesCleaning of vacuum components and plant after useSummaryAcknowledgementsLEAKS AND LEAK DETECTIONReal and virtual leaksMethods of leak detectionLeak detectorsSummaryReferencesSYSTEMSSimple rotary pumped systemDiffusion pumped systemA turbo molecular pumped systemUltra-high vacuum systemA cryo-pumped systemA large fully automated, multi-pumped systemA particle accelerator pumping systemSummaryReferencesAPPENDICESMaximum evaporation rate from a surfaceMolecular dragReynolds' number Re expressed in terms of throughput QThe Knudsen cosine lawA derivation of the Knudsen formula for molecular flow through a pipeAnalysis of a simple systemSystems with distributed volumeSpecifying and measuring flowSpecifying and measuring flowThe maintenance of vacuum equipmentFurther ReadingStandard Graphic SymbolsList of Symbols Used in the TextList of Units Used in the TextIndex