More Details about VLSI Fabrication Principles Silicon And Gallium Arsenide 2nd Edition

General Information  
Author(s)Sorab K Ghandhi
PublisherWILEY INDIA
Edition2nd Edition
ISBN9788126517909
Pages864
BindingSoftbound
LanguageEnglish
Publish YearJanuary 2016

Description

Fully updated with the latest technologies, this edition covers the fundamental principles underlying fabrication processes for semiconductor devices along with integrated circuits made from silicon and gallium arsenide. Stresses fabrication criteria for such circuits as CMOS, bipolar, MOS, FET, etc. These diverse technologies are introduced separately and then consolidated into complete circuits. TABLE OF CONTENTS · Material Properties · Phase Diagrams and Solid Solubility · Crystal Growth and Doping · Diffusion · Epitaxy · Ion Implantation · Native Films · Deposited Films · Etching and Cleaning · Lithographic Processes · Device and Circuit Fabrication Appendix Index