Description
WILEY INDIA Vlsi Fabrication Principles Silicon And Gallium Arsenide 2Nd Edition by Sorab K Ghandhi
Fully updated with the latest technologies, this edition covers the fundamental principles underlying fabrication processes for semiconductor devices along with integrated circuits made from silicon and gallium arsenide. Stresses fabrication criteria for such circuits as CMOS, bipolar, MOS, FET, etc. These diverse technologies are introduced separately and then consolidated into complete circuits.
TABLE OF CONTENTS
· Material Properties
· Phase Diagrams and Solid Solubility
· Crystal Growth and Doping
· Diffusion
· Epitaxy
· Ion Implantation
· Native Films
· Deposited Films
· Etching and Cleaning
· Lithographic Processes
· Device and Circuit Fabrication
Appendix
Index